The Nanoscale Characterization Facility (NCF) supports state-of-the-art tools for electron- and ion-beam analyses for Penn, as well as other university and industry users in the Philadelphia region. Our new facility comprises a suite of rooms specifically designed to host current and next-generation scanning electron, transmission electron and atomic force microscopes. The facility includes an integrated sample preparation laboratory with complete sample coating and plasma cleaning capabilities, as well as cryogenic TEM sample preparation equipment. A computer suite for offline image and data analysis and office and meeting space for staff and industrial users round out the facility in the Singh Center. The NCF also maintains an ion scattering laboratory featuring a 5.1 MeV ion accelerator for thin film characterization and ion implantation. This facility is located nearby in the adjacent Laboratory for Research on the Structure of Matter Building.
"The Quanta 600 FEG Mark II scanning electron microscope (SEM) is equipped with a unique array of accessories to enable the combination of high-resolution imaging and nanoscale manipulation allowing for powerful in situ experiments involving controlled stimuli and correlated response. In situ capabilities include: nanoscale manipulation of specimen or probe, access to the large sample volume by fluids, gases, electrical, optical and mechanical probes; detection of sample response to such probes, including the electron beam itself; and the temperature dependences of all these phenomena."
"The FEI Strata DB235 Focused Ion Beam bridges the gap between nanocharacterization and nanomachining by combining a high resolution field-emission scanning electron microscope with a focused ion beam. Uniting these techniques in a single instrument allows users to seamlessly switch from secondary electron imaging to precision ion milling and ion-beam assisted material depostion and selective etching. Four gas injection systems will allow for platinum deposition and selective etching of carbon, metals, and oxides."
"The JEOL 7500F scanning electron microscope (SEM) is our dedicated conventional and high-resolution imaging microscope. It is equipped with a range of detectors and imaging modes that allow for the study of a wide range of solid materials. Secondary and backscattered electron detectors allow for imaging of sample surfaces, whereas a scanning-transmission electron detector shows the internal structure of materials. Through a stage biasing system, refered to as the "gentle-beam" mode, the electron beam may be reduced to a fraction of the accelerating voltage at the gun, allowing for the imaging of soft or insulating samples without the need for carbon or metal coating."
"Thin film characterization is carried out in the Nanotech Facility's Ion Scattering Laboratory. At the heart of this laboratory is an NEC 5SDH 1.7MV Pelletron Accelerator, which is capable of producing ion beams ranging from 0.2-5.1 MeV. The laboratory maintains three beam lines: (1) A General Purpose Station for Rutherford Backscattering, Particle Induced X-ray Emission and Forward Recoil Spectrometry, (2) a High Resolution Surface Structure Analysis Station with in situ heating and deposition, ion sputtering, a photoemission system, RBS, AES and LEED, and (3) and a Time-of-flight Molecular Beam Epitaxy station. A computer-controlled goniometer aids in the collection of channel maps for crystal structure orientation studies and ion implantation applications."
Instruments are accessible with limited and full technical support.
Instrument reservations can be made following the instructions on the website provided.